SHANGHAI IC R&D CENTER 上海集成电路研发中心有限公司

Company Profile

Shanghai Integrated Circuit R&D Center Co., Ltd. ( ICRD ) was established in 2002. It is a state-level integrated circuit R&D center supported by the state to establish and cooperate with production, education and research. ICRD was formed by the joint investment of China’s integrated circuit-related enterprise groups and universities. It is an independent public R&D institution open to integrated circuit companies, universities and research institutes in the whole industry.

The Shanghai Integrated Circuit R&D Center focuses on mainstream integrated circuit technology routes, and is committed to solving major common technology research and development and service support issues. The main functions of ICRD include: providing integrated circuit companies and R&D units with advanced device and process technology preliminary research and development and product-level verification; providing integrated circuit equipment and materials with development to online verification and process support; providing knowledge for integrated circuit production line upgrades Transfer of property rights and technology; provide special technology and share IP core services for design companies to develop chips ; provide enterprises and universities with a training base for training integrated circuit professional and technical personnel and high-skilled personnel.

The Shanghai Integrated Circuit R&D Center is located in Zhangjiang Hi-Tech Park, Shanghai, adjacent to Huali Microelectronics and SMIC. ICRD has the most advanced 12 -inch open integrated circuit advanced technology research and development and equipment material test platform in China, with a purification area of more than 3000 square meters. The research and development environment and management system are fully matched with the large production line, which can realize the contamination-free in and out of silicon wafers and processes The processes are seamlessly connected, speeding up the speed of technology research and development and verification. ICRD has immersed 193nm lithography machine,
silicon etching machine, atomic layer thin film growth ( ALD ), high-energy ion implanter, and a full set of advanced process equipment such as copper interconnection and Low-K . The process research and development capability can reach below 14 nanometers.

The Shanghai Integrated Circuit R&D Center has an international research team, and has cultivated and trained a R&D team with process technology improvement capabilities through domestic and foreign industrial cooperation. ICRD has mastered the process technology and intellectual property rights of multiple technology generations; through the establishment of industry common technology research and development projects, joint research and development of FinFET devices and processes, nanowire transistors below 5nm and other new devices and process technologies; development of industry-university-research cooperation, research and development Cutting-edge technologies and products such as transistor-level 3D stacking and quantum dot sensors. At the same time, ICRD has established the best integrated circuit talent training base in China through continuous improvement of equipment and facilities and strengthening international cooperation, which is open to the entire industry and universities.

The Shanghai Integrated Circuit R&D Center is also actively exploring the path to internationalization and continuously enhancing its international influence. In addition to co-establishing global talent training centers with multinational companies such as ASML , ICRD has also established advanced technology research and development joint laboratories in cooperation with IMEC , ASML-Brion , Synopsys , Applied Materials, Panlin and other multinational companies, and established joint laboratories with internationally renowned universities. There are ongoing joint research projects.

上海集成电路研发中心有限公司（ICRD）成立于2002年，是国家支持组建、产学研合作的国家级集成电路研发中心。ICRD由中国集成电路相关企业集团和高校联合投资组建而成，是一个独立的面向全行业集成电路企业、大学及研究所开放的公共
研发机构。

上海集成电路研发中心聚焦集成电路主流技术路线，致力于解决重大共性技术的研发及服务支撑问题。ICRD的主要功能包括：为集成电路企业和研发单位提供先进器件及工艺技术的前期研发和产品级验证；为集成电路装备和材料提供研制到上线的验证和工艺配套；为集成电路生产线升级提供知识产权和技术转移；为设计企业研制芯片提供特色工艺和共享IP核服务；为企业及高校提供培养集成电路专业技术人才和高技能人才的实训基地。

上海集成电路研发中心位于上海市张江高科技园区，地理位置毗邻华力微电子和中芯国际。ICRD建有中国最先进的12英寸开放式集成电路先进工艺研发和装备材料试验平台，净化面积超过3000平方米，研发环境及管理系统和大生产线完全匹配，可实现硅片无沾污进出和工艺流程无缝衔接，加快了技术研发和验证速度。ICRD拥有浸没式193nm光刻机、硅刻蚀机、原子层薄膜生长（ALD）、高能离子注入机以及全套铜互连和Low-K等先进工艺设备，工艺研发能力可达14纳米以下。

上海集成电路研发中心拥有一支国际化研究团队，并通过国内外产业合作培养和锻炼了一支拥有工艺技术提升能力的研发队伍。ICRD掌握了多个技术代的工艺技术和知识产权；通过设立产业界共性技术研发项目，进行FinFET器件及工艺、5nm以下
纳米线晶体管等新器件和工艺技术的联合研发；开展产学研合作，研发晶体管级3D堆叠、量子点传感器等前沿技术和产品。

与此同时，ICRD通过不断完善设备设施条件，加强国际合作，建成了中国条件最好的集成电路人才实训基地，并对全行业和高校开放。

上海集成电路研发中心也积极探索国际化道路，不断提升国际影响力。除了和ASML等跨国公司共建全球人才培训中心，ICRD还与IMEC、ASML-Brion、Synopsys、应用材料、泛林等跨国公司都有合作建立的先进技术研发联合实验室，并和国际著名大学建有持续的共同研究项目。