27-28 August 2025
Suwon
Beneq pioneered industrial Atomic Layer Deposition (ALD) with the introduction of the first commercial ALD equipment in 1984. Today, Beneq advances ALD technology adoption and validation with a portfolio that includes Transform®, Transform® 300, and Prodigy™ for specialty semiconductor device fabrication; TFS 200 and TFS 500 for R&D; innovative spatial ALD platforms such as the C2R™, and Genesis for roll-to-roll processing. Beneq’s products support process innovation from lab to fab, enabling integration of ALD in high volume manufacturing. Headquartered in Espoo, Finland, Beneq operates globally to help customers scale ALD solutions for the future of semiconductors, optics, and functional coatings.
Beneq Transform® is an ALD cluster tool designed for technology development and manufacturing across power electronics (SiC, GaN, Si), RF, optoelectronics, microLED, MEMS, and sensors. Built for volume production, Beneq Transform scales with throughput and application requirements. It is an ideal platform for applications requiring surface engineering such as surface passivation of wide-band gap materials. Beneq Transform® 300 extends the offering to 12 ” wafer size.