In parallel to additive manufacturing leading the revolution in traditional manufacturing, the same principles can revolutionize traditional thin film deposition techniques. Where lithography and vapor phase deposition techniques struggle, for example, with device development for rapid innovation or incompatibility with the used chemistry, additive manufacturing can shine. Indeed, several approaches are in development for 3D nanopriting.1,2,3

Atomic Layer Deposition, and in more general Atomic Layer Processing, offers a unique opportunity for localized 3D processing/printing due to its two-step process. While simple in theory, due to well-developed examples of Spatial Atomic Layer Deposition (sALD), in practice miniaturization of sALD requires substantial effort into the creation of suitable micro-nozzles. Uniquely, ATLANT 3D has developed proprietary Spatial ALD micronozzles, naming the process microreactor Direct Atomic Layer Processing – µDALPTM. 4

In recent years, the team at ATLANT 3D has been able to significantly develop the technology to reduce the µDALPTM resolution, increase material capabilities, assessable morphologies, and develop new instruments for industrial scalable manufacturing. All of which enabling the development of novel MEMS sensors which will be covered in this talk including examples of recent development done by ATLANT 3D’s technology which is not possible with other thin film deposition techniques and lithography.

[1] Kundrata I. et al., ALD/ALE 2022 [Int. Conf.], 2022
[2] de la Huerta C. A. M. et al., arXiv, 2020, 0523.
[3] Winkler, R. et al., J. Appl. Phys., 2019, 125, 210901
[4] Kundrata I., et al., Small Methods., 2022, 6 (5), 2101546