Computer modeling has long been recognized as a powerful tool for accelerating development and reducing the costs of various manufacturing processes. In the semiconductor industry, modeling has already become a reliable workhorse for certain production processes, while for other processes, companies are still looking for modeling solutions that could capture complex physical and chemical phenomena to support further technology development.

In the present work, we demonstrate the latest capabilities of STR’s modeling software, which enable accurate analysis and optimization across multiple stages of semiconductor manufacturing, including crystal growth, epitaxy, and device processing steps such as oxidation, ALD, and etching.